Xylene is also mixed with HMDS, then spun on to a wafer to aid in adhesive of photoresist to the silicon wafer. There is however one tiny problem, Choline is very, very expensive. Aqueous-alkaline removers The simplest but nevertheless highly effective removers are sodium hydroxide NaOH and potassium hydroxide KOH solutions. Sensitive structures on the wafer however have to be protected during this procedure or are destroyed otherwise. In the normal inorganic caustics, the active part of the molecule is the hydroxide [ ], while the Sodium or Potassium is merely along to neutralize the charge on the [ ].
| Etching Chemical for Photoresist Stripping |
KMG - Photoresist Strippers. Yet, in line with the growth in the Chinese LCD industry, this is becoming an opportunity for the companies within the supply chain. This is not a pretty picture. ACT AS has excellent cleaning capabilities that make this product unique. ACT AS can be used in aluminum applications. The real reason that this occurs is that dissolved copper in the stripper is a catalyst which accelerates the tarnishing of the copper metal substrate.
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